Purity:W≥99.95%;
Density: ≥19.0g/cm3
Flatness: ≤2%
Standard: GB/T3875-83 or ASTM B 760-86
Suitable for producing ion implantation parts
For producing electric light source parts,components of electric vacuum
For producing W-boats,heat shield and heat bodies in high temperature furnace
Used for tungsten sputtering target
Used for reflection shield, cover plate applied in sapphire growth furnace
Thickness | Thickness Tolerance | Width | Width Tolerance | Length | Length Tolerance | Delivery Condition |
---|---|---|---|---|---|---|
1.0 | ±0.08 | 10~300 | ±0.5 | 600 | ±0.5 | Cold rolled |
1.3 | ±0.12 | 10~400 | ±0.5 | 600 | ±0.5 | Cold rolled |
2.0 | ±0.12 | 10~500 | ±0.5 | 700 | ±0.5 | Cold rolled |